Necmi Biyikli
Associate Professor/Electrical and Computer Engr

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Scholarly Contributions

103 Scholarly Contributions

76
Poster/Presentations
26
Journal Articles
1
Conference Proceedings
Investigating the effect of plasma chemistry on the InOxNx films grown via plasma-enhanced atomic layer deposition
2019
Necmi Biyikli, Adnan Mohammad, Liam Gerety, Brian G Willis, Deepa Shukla, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Investigating the Role of N2 Plasma Composition on the Atomic Layer Growth of InN Films Using Hollow-Cathode Plasma Source
2020
Saidjafarzoda Ilhom, Brian G Willis, John Grasso, Necmi Biyikli, Deepa Shukla, Adnan Mohammad, Ali K Okyay
Research Type: Poster/Presentation

Investigating plasma influence on the crystallinity of III-nitrides films grown by plasma-assisted atomic layer deposition
2019
Adnan Mohammad, Brian G Willis, Deepa Shukla, Hamza Malik, Necmi Biyikli, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Investigating Plasma Parameters and Influence of Argon to the Crystallinity of GaN Films Grown by Plasma-Assisted ALD
2019
Saidjafarzoda Ilhom, Brian G Willis, Adnan Mohammad, Necmi Biyikli, Deepa Shukla
Research Type: Poster/Presentation

Influence of Metal Precursors on the Low-Temperature Crystalline Vanadium Oxide Synthesis Using Oxygen Plasmas
2023
Necmi Biyikli
Research Type: Poster/Presentation

Inductively coupled plasma-polymerized CFx inhibition layers for selective oxide and metal deposition
2019
Necmi Biyikli
Research Type: Poster/Presentation

In-situ ellipsometric analysis of plasma-assisted ALD-grown stoichiometric and crystalline AlN films
2019
Saidjafarzoda Ilhom, Brian G Willis, Blaine Johs, Deepa Shukla, Adnan Mohammad, Necmi Biyikli, Ali K Okyay
Research Type: Poster/Presentation

In-situ Ellipsometric Analysis of the Plasma Influence on Atomic Layer Deposited AlN Thin Films
2019
Necmi Biyikli, Saidjafarzoda Ilhom, Brian G Willis, Adnan Mohammad, Deepa Shukla
Research Type: Poster/Presentation

In situ monitoring atomic layer doping processes for Al-doped ZnO layers: Competitive nature of surface reactions between metal precursors
2022
Deepa Shukla, Adnan Mohammad, Saidjafarzoda Ilhom, Necmi Biyikli
Research Type: Journal Article

In situ Atomic Layer Doping of Epitaxially Grown β-Ga2O3 Films via Plasma-enhanced ALD at 240 °C
2023
Necmi Biyikli
Research Type: Poster/Presentation

In situ Atomic Layer Doping Coupled Low-temperature Epitaxial Growth of β-Ga2O3 Films via Plasma-enhanced ALD
2022
Necmi Biyikli, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Improving the Electrical Breakdown Strength of Polyimide Films with Large Bandgap ALD Coatings
2020
Chao Wu, Yang Cao, Saidjafarzoda Ilhom, Necmi Biyikli
Research Type: Poster/Presentation

Impact of substrate and ex-situ/in-situ surface cleaning on plasma-ALD grown AlN films
2019
Adnan Mohammad, Brian G Willis, Sylvester Jung, Saidjafarzoda Ilhom, Deepa Shukla, Necmi Biyikli
Research Type: Poster/Presentation

Hollow-cathode plasma-assisted atomic layer deposition of III-nitrides: How the substrate and plasma chemistry impacts the Raman spectroscopy analysis of GaN and InN thin films
2020
Deepa Shukla, Adnan Mohammad, Mustafa Alevli, Nese Gungor, Necmi Biyikli, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Hollow-cathode plasma deposited vanadium oxide films: Metal precursor influence on growth and material properties
2024
Dhan Rana, Brian G Willis, Boris Sinkovic, Saidjafarzoda Ilhom, Krishna D Joshi, Necmi Biyikli, A K Okyay, Barrett O Wells, Adnan Mohammad
Research Type: Journal Article

Hollow-Cathode Plasma-ALD of Titanium Nitride Films Using In-Situ Ellipsometry for Conductivity Analysis
2023
Saidjafarzoda Ilhom, Necmi Biyikli
Research Type: Poster/Presentation

Hollow Cathode Plasma Enhanced Atomic Layer Deposition of Vanadium Oxide Films: in situ Ellipsometric Monitoring of Film Growth with TEMAV and Oxygen Plasma
2021
Brian G Willis, Adnan Mohammad, Deepa Shukla, Necmi Biyikli, Barrett O Wells, Ali K Okyay, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Hole Transport Properties of Nickel Oxide Films Grown via Hollow-Cathode Plasma-Assisted Atomic Layer Deposition
2022
Necmi Biyikli, Saidjafarzoda Ilhom
Research Type: Poster/Presentation

Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
2017
Evgeniya Kovalska, Ali Haider, Petro Deminskyi, Necmi Biyikli
Research Type: Journal Article

Gaining insight into self-limiting surface reactions during plasma-assisted atomic layer deposition of III-nitrides via in-situ ellipsometry
2019
Ali K Okyay, Necmi Biyikli, Deepa Shukla, Saidjafarzoda Ilhom, Adnan Mohammad, Blaine Johs, Brian G Willis
Research Type: Poster/Presentation