Necmi Biyikli
Associate Professor/Electrical and Computer Engr
Storrs Mansfield
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Scholarly Contributions
103 Scholarly Contributions
Feasibility of Boron Nitride Film Growth at Lower-than 250C Substrate Temperature via Hollow-Cathode Plasma-ALD: In-situ Monitoring of Plasma Composition Effect
2020
Research Type: Poster/Presentation
Feasibility Study of Single and Multi-layered Graphene as Plasma-compatible Deactivation Layers for Selective Deposition of III-Nitride Materials
2017
Research Type: Poster/Presentation
Facile Synthesis of Three-Dimensional Pt-TiO2 Nano-networks: A Highly Active Catalyst for the Hydrolytic Dehydrogenation of Ammonia–Borane
2017
Research Type: Poster/Presentation
Excitation Wavelength-Dependent Photoluminescence Decay of Single Quantum Dots near Plasmonic Gold Nanoparticles
2022
Research Type: Journal Article
Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films
2020
Research Type: Journal Article
Electrospinning Combined with Atomic Layer Deposition to Generate Applied Nanomaterials: A Review
2020
Research Type: Journal Article
Electro-optical characteristics of low-temperature plasma-assisted ALD-grown InN films as active layers in visible/near-IR photodetectors
2019
Research Type: Poster/Presentation
Electrical and Optical Properties of P-Type NiO Films Grown via Nickelocene Precursor in a Hollow-Cathode Plasma-ALD Reactor
2022
Research Type: Poster/Presentation
Efficient and Flexible Dielectrics at Elevated Temperatures from Polymers Sandwiched with Wide Bandgap Inorganic Films Grown via Atomic Layer Deposition
2020
Research Type: Poster/Presentation
Crystalline GaN Film Growth at a Thermal Budget Approaching 100C Using Hollow-Cathode Plasma-Assisted Atomic Layer Deposition
2020
Research Type: Poster/Presentation
Critical Layer Thickness Determination for GaN Thin Films Grown on Sapphire Substrate via Hollow-Cathode Plasma-assisted Atomic Layer Deposition
2017
Research Type: Poster/Presentation
Comparative study on in-situ ellipsometric monitoring of III-nitride film growth via plasma-enhanced atomic layer deposition
2020
Research Type: Journal Article
Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors
2017
Research Type: Journal Article
Atomic layer deposition of metal oxides for efficient perovskite single-junction and perovskite/silicon tandem solar cells
2020
Research Type: Journal Article
Atomic layer deposition for efficient and stable perovskite solar cells
2019
Research Type: Poster/Presentation
Atomic Layer Doped Epitaxial β-Ga2O3 Films Grown via Supercycle and Co-dosing Approaches at 240 °C
2022
Research Type: Poster/Presentation
As-grown Crystalline β-Ga2O3 Films Obtained at Low Temperatures via In Situ Atomic Layer-by-layer Plasma Processing
2021
Research Type: Poster/Presentation
As-Grown Crystalline beta-Ga2O3 Films via Plasma-Enhanced ALD at Low Substrate Temperatures
2020
Research Type: Poster/Presentation