Necmi Biyikli
Associate Professor/Electrical and Computer Engr
Storrs Mansfield
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Scholarly Contributions
103 Scholarly Contributions
Self-limiting Growth of III-nitride Materials via Hollow-cathode Plasma-ALD: Structural and Chemical Analysis
2018
Research Type: Poster/Presentation
Multilayered Graphene Blocking/Lift-off Layers Towards Selective Plasma-ALD of III-nitride Films
2018
Research Type: Poster/Presentation
Nucleation properties of ALD-grown Al2O3 on plasma-treated Au surfaces via in-situ ellipsometry
2018
Research Type: Poster/Presentation
Real-time in-situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
2019
Research Type: Journal Article
In-situ Ellipsometric Analysis of the Plasma Influence on Atomic Layer Deposited AlN Thin Films
2019
Research Type: Poster/Presentation
Analyzing Self-limiting Surface Reaction Mechanisms of Metal Alkyl Precursors and Nitrogen Plasma Species: Real-time In-situ Ellipsometric Monitoring of III-nitride Plasma-ALD Processes
2019
Research Type: Poster/Presentation
Investigating the effect of plasma chemistry on the InOxNx films grown via plasma-enhanced atomic layer deposition
2019
Research Type: Poster/Presentation
Inductively coupled plasma-polymerized CFx inhibition layers for selective oxide and metal deposition
2019
Research Type: Poster/Presentation
Low-temperature self-limiting growth of beta-Ga2O3 films on flexible substrates via plasma-enhanced ALD
2019
Research Type: Poster/Presentation
Low-temperature Growth of Wide Bandgap Nitride and Oxide Thin Films via Plasma-assisted Atomic Layer Deposition: Influence of rf-plasma Source and Plasma Power
2019
Research Type: Poster/Presentation
Impact of substrate and ex-situ/in-situ surface cleaning on plasma-ALD grown AlN films
2019
Research Type: Poster/Presentation
Investigating plasma influence on the crystallinity of III-nitrides films grown by plasma-assisted atomic layer deposition
2019
Research Type: Poster/Presentation
Gaining insight into self-limiting surface reactions during plasma-assisted atomic layer deposition of III-nitrides via in-situ ellipsometry
2019
Research Type: Poster/Presentation
An Alternative Route for Low-Temperature Growth of Crystalline III-Nitride Thin Films and Nanostructures - Hollow-Cathode Plasma-Assisted Atomic Layer Deposition
2019
Research Type: Poster/Presentation
Investigating Plasma Parameters and Influence of Argon to the Crystallinity of GaN Films Grown by Plasma-Assisted ALD
2019
Research Type: Poster/Presentation
Atomic layer deposition for efficient and stable perovskite solar cells
2019
Research Type: Poster/Presentation
Electro-optical characteristics of low-temperature plasma-assisted ALD-grown InN films as active layers in visible/near-IR photodetectors
2019
Research Type: Poster/Presentation
Plasma-enhanced atomic layer deposition of vanadium dioxide (VO2) using TEMAV and oxygen plasma
2019
Research Type: Poster/Presentation
Role of Hydrogen Radicals in the Surface Reactions of Trimethyl-Indium (TMI) with Ar/N2 Plasma in Hollow-Cathode Plasma-Assisted ALD
2019
Research Type: Poster/Presentation